ED-XRF Spectroscopy Unit

EQUIPMENT

In the XRF technique, the analyzed sample is irradiated with primary X-rays and subsequently emits fluorescent X-rays, which are characteristic of the atoms present in the sample and are used for the elemental analysis. Thus, any XRF spectroscopy equipment typically consists of an X-ray source for sample excitation and a detection system for detecting the secondary fluorescent X-rays.

The Unit maintains two home-built ED-XRF spectroscopy arrangements, with the following features:

Exciting radiation:

• annular radioisotopic sources: ¹⁰⁹Cd (T_1/2~463 d) and ²⁴¹Am (T_1/2~432 y)

Detectors:

• Si(Li) semiconductor (CANBERRA, SL80175):  5-mm-thick crystal, 80 mm² active surface, 25-μm-thick Be window, 171 eV resolution at 5.9 keV, LN2 cooling

• Si-PIN diode (Amptek X-123 complete X-ray spectrometer):  300-μm-thick, 6 mm² area, 12.5-μm-thick Be window, 145 eV resolution at 5.9 keV, thermoelectric cooling

Software:

• Commercial software for data acquisition and display, IAEA WinQXAS freeware, for spectral analysis, home-made codes for fundamental parameter analysis

Elemental range:

• Chlorine (Cl) to uranium (U), detection limits depend on the specific element and sample matrix

Sample preparation facilities:

Standard laboratory equipment - grinders, mortars, sieves, furnace, balance, pellet press, freeze drier - is used for sample handling and preparation, while chemical reagents and standard reference materials for quantitative analysis are also available.

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